University of NM sues Intel over patent infringement
updated 08:20 pm EST, Mon November 15, 2010
UNM holds patents for lithography tech
The University of New Mexico has filed a lawsuit accusing Intel if illegally using technology protected by a university-held patent. The institution's technology-licensing arm, UNM.STC, has accused the company of infringing on a patent related to double patterning lithography technology, which is used to manufacture semiconductor components.
The latest filing arrives after UNM engaged in similar disputes with Taiwan Semiconductor Manufacturing Co and Samsung. UNM.STC later dropped the complaints after both companies signed licensing agreements, although details regarding specific royalty payments remain unclear, according to an EE Times report.
"We would be thrilled to have Intel as a licensee," said STC president and CEO Lisa Kuuttila. "I think it's fair to say the university believes that it is due the proper the agreements in place for reasonable royalties if the companies are using the double patterning lithography, which we believe is very important to the industry."
Intel has yet to publicly respond to the legal filing.
